Abstract
Cathodic arc plasmas are known to be contaminated with macroparticles. A variety of magnetic plasma filters have been used with various success in removing the macroparticles from the plasma. In this publication, an open-architecture, double-bent filter that is twisted (‘Twist Filter™’) is described. A cathodic arc plasma deposition system was designed around this novel, very compact and efficient filter. Its major application is the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
