Abstract
Fe (001) thin films with different crystal lattice were epitaxially grown on single crystal MgO substrates under the various sputtering pressures. It is found in this paper that the tetragonality and magnetic anisotropy of Fe thin film is tuned by varying the working sputtering pressures. The tunability of the crystal lattice and the magnetic anisotropy of Fe films were characterized by X-ray reflectivity, X-ray diffraction and vibrating sample magnetometer. The tunable structure and magnetic properties of Fe thin films may attribute to the rearrangement of Fe atoms on MgO substrate induced by controlling the atomic kinetic energy under different sputtering pressure.
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