Abstract
Co thin films on Si (1 0 0) substrates with different seed layers (Au or AlOX) have been deposited for variable speed of substrate rotation (Rsub) at room temperature (RT) or 200 °C. Hysteresis measurements by magneto optic Kerr effect reveals that the films show growth induced uniaxial anisotropy when prepared without the substrate rotation (i.e. Rsub = 0 rpm). The films prepared at RT show a decrease but non-vanishing uniaxial anisotropy with increase in Rsub. However, high temperature deposition along with substrate rotation leads to formation of isotropic films. The change in anisotropy has been quantitatively investigated using ferromagnetic resonance (FMR) spectroscopy. Further, domain images observed by Kerr microscopy corroborate to the change in anisotropy behavior. We find that by choosing the right combination of seed layer as well as the growth parameters, the anisotropy can be systematically tuned.
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