Abstract
AbstractWe report on the fabrication and optical characterization of ordered hexagonal arrays of non‐closed‐packed GaN nano‐pillars formed by nanosphere lithography. A self‐assembled two‐dimensional monolayer of silica nanosphere mask was coated by the technique of spin‐coating. A silica‐selective dry etch recipe was employed to adjust the diameters of the nanospheres. With the dimension‐adjusted nanospheres as an etch mask, the pattern was transferred to a wafer to form a photonic crystal structure. The photonic bandgap structures were designed using Plane Wave Expansion algorithm for bandgap computations. The existence and positions of bandgaps have been verified through angular resolved reflectivity measurement, which correlated well with prediction of simulations. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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