Tungsten/Platinum Hybrid Nanowire Growth via Field Emission Using Nanorobotic Manipulation

Zhan Yang,Toshio Fukuda,Yasuhito Ode,Masahiro Nakajima

doi:10.1155/2011/386582

Abstract

This paper reports tungsten-platinum hybrid nanowire growth via field emission, based on nanorobotic manipulation within a field emission scanning electron microscope (FESEM). A multiwalled carbon nanotube (MWCNT) was used as the emitter, and a tungsten probe was used as the anode at the counterposition, by way of nanomanipulation. By independently employing trimethylcyclopentadienyl platinum (CpPtMe3) and tungsten hexacarbonyl (W(CO)6) as precursors, the platinum nanowire grew on the tip of the MWCNT emitter. Tungsten nanowires then grew on the tip of the platinum nanowire. The hybrid nanowire length wascontrolled by nanomanipulation. Their purity was evaluated using energy-dispersive X-ray spectroscopy (EDS). Thus, it is possible to fabricate various metallic hybrid nanowires by changing the precursor materials. Hybrid nanowires have various applications in nanoelectronics, nanosensor devices, and nanomechanical systems.

Highlights

Nanoelectronic and nanoelectromechanical (NEMS) devices have been widely investigated in recent years
This paper reports the hybrid nanowire growth via field emission, using two precursors and nanorobotic manipulation inside field emission scanning electron microscope (FESEM)
An multiwalled carbon nanotube (MWCNT) was used as the emitter,and nanowire growth was controlled by nanorobotic manipulation, maintaining a constant gap between the MWCNT tip and tungsten electrode

Summary

Introduction

Nanoelectronic and nanoelectromechanical (NEMS) devices have been widely investigated in recent years. Precise and controllable nanofabrication methods are important for developing novel nanodevices. Numerous metallic nanowires have been synthesized from porous membranes [4,5,6], organic nanotube templates [7], surface step edge [8] and biotemplate methods [9]. Electron-beam-induced deposition (EBID) [10] and ion-beam-induced deposition (IBID) [11] are important techniques for single metal nanowire growth [12]. These methods employ electron or ion beams which are focused on a substrate, in a low pressure gas chamber containing the precursors. Precursor molecules contain the elements to be deposited upon dissociation, with heavy parts of the molecule being fixed on the solid substrate and volatile parts being evacuated

Methods

Discussion

Conclusion