Abstract
Chromium tungsten nitride films were deposited using magnetron sputtering with ion beam assistance. The content of the films was controlled through the power supplied to the chromium and tungsten targets. Results indicate that the tungsten atoms incorporated into chromium nitride films and formed the chromium tungsten nitride solid solution phase. Moreover, results of this study provide further insight into how various concentrations of tungsten affect the lattice constant, preferred orientation, crystallite size, surface morphology, hardness, internal stress, and adhesion of the films.
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