Étude expérimentale de la pulvérisation cathodique réactive du cobalt

Abstract

The reactive d.c. sputtering of a Co target in argon-oxygen mixtures has been studied. The chemical structure of the thin films formed (Co-β, CoO and Co 3O 4) has been studied by X-ray diffraction, and particles ionized in the plasma have been detected with a quadrupole mass filter. The mechanisms suggested are: CoO formation on the surface of the target and sputtering of CoO; CoO production in the plasma and Co 3O 4 production on the substrate.