Tribological Properties and the Abrasion Resistance Thin Films of Chromium Nitride

Abstract

Chrome nitride (CrN) and CrN/Cr thin films were grown on EN ISO HS6-5-2 tool steel, which has been used as a substrate material. It is a high-speed Mo-W steel with high toughness. Chrome nitride thin films were deposited using a RF PA CVD/Magnetron Sputtering (MS) system at a gas flow ratio of 15/13 sccm of Ar/N2. During the deposition process the pressure in the vacuum chamber was 0.9 Pa, the deposition Ubias and deposition time were different. The parameters of the process influence properties of the thin films were microstructure, hardness and adhesion to the substrate, etc. Optimal selection of process parameters is needed to achieve particular property combinations. The basis of the tribological measurements was the “ball-on-disc” testing method. Tribological testing (EN1071-13:2010) was conducted using a ball made from Si3N4 with a diameter of 6.350 mm, with a constant load of 3N at room temperature and humidity of 40±2 %. A Zeiss AXIO Imager M2 light optical microscope and a Dektak XT TM mechanical profilometer were used to evaluate the wear of the friction pairs at a load of 6mg and the size of the measured area of 200x1000 μm. The basis of the tribological measurements is the “ball-on-disc” testing method. Tribological testing (EN1071-13:2010) was conducted using a ball made from Si3N4 with a diameter of 6.350 mm, with a constant load of 3N at room temperature and humidity of 40±2 %. A Zeiss AXIO Imager M2 light optical microscope and a Dektak XT TM mechanical profilometer were used to evaluate the wear of the friction pairs at a load of 6mg and the size of the measured area of 200x1000 μm.