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Abstract
AbstractWe report on the fabrication of high aspect ratio diamond Micro Electrode Arrays (MEAs) grown on silicon as well as on glass substrates using an optimised nanoseeding technique and Bias Enhanced Nucleation (BEN). Such MEA systems combine high electrode reactivity and high electrical current injection limits with resiliency, biocompatibility and optical transparency of diamond surfaces. We present the technological steps for the fabrication of 2D as well as 3D diamond microelectrode arrays. The patterning issues involve the use of detonation nanodiamond particles (DND). (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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