Abstract

Epitaxial and polycrystalline SnO2 thin films were prepared by the excimer laser annealing of amorphous SnO2 films on TiO2 (001) and MgO (001) substrates. The amorphous SnO2 film was prepared by a metal organic deposition (MOD) using di-n-butylbis (2, 4-pentanedionate) tin at 300°C. The crystallinity and orientation of the product films were investigated by the XRDΘ—2Θ, pole figure and transmission electron microscopy (TEM) analyses. At 200 mJ/cm2, the (002) oriented SnO2 films were obtained by KrF laser irradiation. Using the XRD φ scanning measurement and TEM, it was found that the oriented SnO2 films were epitaxially grown on the (001) TiO2 substrate. On the other hand, the polycrystalline SnO2 film was obtained on the MgO (001) substrate. It was found that the grain size of the SnO2 film on the MgO substrate near the surface is larger than that of the near substrate based on crosssectional bright field TEM micrographs.

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