Abstract
We demonstrate the construction of diamond photonic crystal structures by the translation of a multi-beam interference pattern. Using phase shift of each beam, the double-exposed interference patterns can be aligned in the [111] direction for a face-centered cubic (FCC) and [210] direction for a body-centered cubic (BCC), respectively, producing diamond D from FCC and BCC-diamond like structure from BCC. The present result shows that the complete bandgap has been retained with slight deviation from ideal diamond symmetry.
Highlights
Photonic crystals (PCs) are called a semiconductor of light and can be used to confine, manipulate and guide photons, which are desired for the next-generation optical circuits
The photonic bandgaps (PBGs) is robust enough to allow some structural modification within diamond symmetry,7 This makes diamond structures especially attractive over other symmetries since it allows application of a wide range of approaches to fabricate them conveniently, including Yablonobite by direct drilling,8 woodpile (-diamond) by layer-by-layer fabrication,9 -diamond by layer-by-layer followed by reactive ion etching,10 spiral diamond made by GLAD.11
In the case of holographic lithography, it has been reported that four interfering beams can be assembled to create the level-set D and G structures, and body-centered cubic (BCC) diamond
Summary
Photonic crystals (PCs) are called a semiconductor of light and can be used to confine, manipulate and guide photons, which are desired for the next-generation optical circuits. In the case of holographic lithography, it has been reported that four interfering beams can be assembled to create the level-set D (diamond) and G (gyroid) structures, and body-centered cubic (BCC) diamond.12-15 All of these structures possess a PBG with larger than 20% between the 2nd and 3rd bands for a refractive index of n=3.6, close to the largest yet calculated.. We investigate the PBGs of two superimposed interference patterns of FCC and BCC, displaced in aforementioned directions This method can be achieved by using double-exposure holographic lithography with phase shift to produce polymeric structures.. Practical fabrication of photoresist structures with clearly defined and completely opened pores.20,21 This method can be flexible by changing the intensity of each exposure, resulting in F43m from FCC interference pattern, which has two different PBGs. Practical fabrication of photoresist structures with clearly defined and completely opened pores. this method can be flexible by changing the intensity of each exposure, resulting in F43m from FCC interference pattern, which has two different PBGs.
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