Translation from Schottky Barrier to Atomic Bridging-Type Surface Photovoltages in Cr-Aqueous-Solution-Rinsed Si(001) Wafers

Abstract

The Cr(OH)3/n-Si Schottky-barrier-type AC surface photovoltage (SPV) in n-type Si(001) wafers fades away during long air exposure at room temperature and/or thermal oxidation at 100 °C for a short time (10 min), indicating a collapse of the Schottky barrier. At 100 °C, the AC SPV reappears with a longer duration time in n-type Si wafers, explaining the occurrence and growth of a negative oxide charge because of the formation of an atomic bridging (CrOSi)- or CrO2- network reported previously. At 200 °C, the AC SPV approaches a strong inversion state in n-type Si. In contrast, in p-type Si(001) wafers, the AC SPV decreases with oxidation duration time at 100 °C. At 200 °C, the AC SPV completely disappears in p-type Si. This result explains why a positive fixed oxide charge in p-type Si was compensated for by the growth of a Cr-induced negative charge [(CrOSi)- or CrO2- network]. This reverse interrelation gives evidence that the translation occurs from the Schottky barrier to the atomic bridging AC SPV, and thus the Cr-induced negative charge can be proved to be described as (CrOSi)- and/or CrO2- networks as well as (AlOSi)- or (FeOSi)- networks that were demonstrated previously.