Transition metals specifically electrodeposited into porous silicon

Abstract

AbstractPorous silicon (PS) is fabricated by anodization in aqueous hydrofluoric acid solution in the transition region between meso and macro pores. In the employed process the pore‐diameters are adjustable from 30 nm up to 100 nm using the same electrolyte as well as the same doping density of the wafer. Furthermore the self‐assembled pore‐arrangements show a quasi‐regular three‐dimensional nano‐architecture. These achieved PS‐membranes offering oriented pores with an aspect ratio around 1000 are filled with a transition metal in a galvanic deposition process. The use of different metals (Ni, Co, NiCo, Cu) together with the proper variation of the deposition parameters (e.g. current density and pulse duration) as well as the employment of different morphologies of the templates allow to tune the shape of the metal precipitations as well as their spatial distribution within the channels and therefore the possibility arises to influence the physical properties of the specimens. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)