Transient, Reusable Top-Coats for the Vertical Orientation of High-χ Block Copolymers for Nanopatterning

Jae Eun Lee,Nari Jeon,Jinman Kim,Minkyung Ko,Hee Jae Choi,Hyeong Min Jin,Geon Gug Yang,Jisoo Lim,Bomyeong Choi,Ji Sung Park,Jang Hwan Kim

doi:10.1021/acsanm.3c02984

Transient, Reusable Top-Coats for the Vertical Orientation of High-χ Block Copolymers for Nanopatterning

Jae Eun Lee, Nari Jeon + Show 9 more

https://doi.org/10.1021/acsanm.3c02984

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Journal: ACS Applied Nano Materials

Publication Date: Sep 11, 2023

Affiliation: Korea Advanced Institute of Science and Technology, Chungnam National University

#High-χ Block Copolymers #Vertical Orientation + Show 1 more

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Transient, Reusable Top-Coats for the Vertical Orientation of High-χ Block Copolymers for Nanopatterning

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