Abstract
In this work thin foils of amorphous alloys VP800 (Fe73Si16B7Cu1Nb3) and VV8025X (Fe4Co66B14Cu1Nb2Mo1) maintained at the onset point temperature for primary crystallisation were irradiated with slow heavy ions (100–300keV Ar and Xe) at the fluence changing from 1010 to 1013ions/cm2. The preferential surface modification during ion implantation-sputtering was analysed with SRIM and PIXE. With the use of CEMS Fe and Fe(Si) clusters accompanied by Fe3Si and even Fe23B6 nanocrystals were found in the films irradiated at a lower fluence, whereas rather amorphous structure was found in surfaces more heavily implanted.
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