Abstract
Si nanoparticles embedded in a ZnO matrix were produced by a sequential deposition of ZnO/Si/ZnO layers, by radio frequency sputtering. Sample growth temperatures of 25 °C, 300 °C, and 500 °C were used to deposit ZnO/Si/ZnO layers on soda lime glass and p-type silicon substrates; ZnO layers were deposited by reactive radio-frequency sputtering employing a mixture of Ar/O2, with a ratio of 66/33, as working atmosphere. The type of substrate and the growth temperature affect the first ZnO layer roughness, promoting the formation of silicon nanoparticles, matrix characteristics, and as consequence, spectral response. The roughness of the initial ZnO layer is transferred to the top layer of ZnO, and it can be tailored between 65 and 370 Å, depending on the sample growth temperature. Transmission electron microscopy show that substrate temperature mainly affects the density of silicon nanoparticles rather than their size. ZnO/Si/ZnO films deposited on p-type silicon substrate were processed and photosensors were obtained, showing a selective response in the 950 to 1150 nm wavelength range, making them suitable candidates for near infrared detectors.
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