Abstract
The photonic de Broglie wavelength of a non-degenerate entangled photon pair is measured by using a Young’s double slit interferometer, which proves that the non-degenerate entangled photon pairs have the potential to be used in quantum lithography. Experimental results show that the de Broglie wavelength of non-degenerate biphotons is well defined and its wavelength is neither the wavelength of the signal photon, nor the wavelength of the idler photon. According to the de Broglie equation, its wavelength corresponds to the momentum of the biphoton, which equals the sum of the momenta of signal and idler photons. The non-degenerate ghost interference/diffraction is also observed in these experiments.
Highlights
In 1995, Jacobson et al pointed out that an ensemble of photons could be treated as in a Bose condensate and has a de Broglie wavelength given by λ/N, where λ and N are the wavelength and average number of photons, respectively [1]
The photonic de Broglie wavelength of multiphoton states can be measured by using an interferometer with an “effective beam splitter” that does not split multiphoton states into different parts
The multiphotons used in quantum lithography experiments were usually composed of photons with the same wavelength
Summary
In 1995, Jacobson et al pointed out that an ensemble of photons (under certain conditions) could be treated as in a Bose condensate and has a de Broglie wavelength given by λ/N, where λ and N are the wavelength and average number of photons, respectively [1]. The wavelength of those photons is determined by the “internal structure” of them, i.e., the de Broglie wavelength of those photons, or if it has a de Broglie wavelength at all, it is determined by the situation of its internal binding. The multiphotons used in quantum lithography experiments were usually composed of photons with the same wavelength (except in [4] in which the non-degenerate biphotons were studied in a Mach–Zehnder interferometer).
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