Abstract
Semiconductor manufactures are increasing reliant on optical emission spectroscopy (OES) to source information on plasma characteristics and process change. However, nonlinearities in the response of OES sensors and errors in their calibration lead to discrepancies in observed wavelength detector response. This paper presents a technique for the retrospective spectral calibration of multiple OES sensors. Underlying methodology is given, and alignment performance is evaluated using OES recordings from a semiconductor plasma process. The paper concludes with a discussion of results and suggests avenues for future work.
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