Abstract
AbstractWe report the growth of ZnO nanowires on mesoscale periodically patterned silicon. The aim of this work is to go towards fabrication of multifunctional heterostructured materials for increasing the specific surface area and light absorption properties. ZnO nanowires (NWs) were grown by chemical bath deposition technique on patterned silicon. Silicon patterning was conducted by two methods, namely, laser interference lithography and nanosphere lithography. We have studied the structural and optical properties of the ZnO NWs grown on these silicon patterns. (© 2016 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
