Abstract
In this paper we present a quick and easy method for producing relatively large areas of substrate that enhance the Raman effect, using standard semiconductor processing techniques such as reactive ion etching of silicon and electron beam metal deposition. As standard cleanroom processes are used, it is possible to narrowly control the parameters of the fabrication process to create silicon nano-pillars with controlled heights and spacing. The silicon nano-pillars are coated by thin films of silver and/or gold to create surfaces that greatly enhance the Raman effect. Surface enhanced Raman scattering (SERS) has numerous applications in chemical sensing, with high sensitivity and fast analysis speed seen as the main advantages, and these novel substrates are believed to be able to make SERS more applicable.
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