Abstract

Solubility of Sn in Ge network gives it a preference for photonic applications, because of the direct transition in GeSn alloy. Here, we employed the metal-induced crystallization (MIC) process of amorphous Ge and Si via Sn as a novel mechanism to incorporate Sn inside Ge and Si networks. (Al/Si/Sn/Ge/Sn) and (Al/Ge/Sn/Ge/Sn) multilayers are deposited by thermal vacuum evaporation on different substrates. The devices are annealed under low vacuum at 500 °C to incorporate the oxygen for band-gap tuning. The structure of Ge-doped nanocrystals is investigated. The direct transition and band-gap values have been estimated using diffuse reflectance spectroscopy and photoluminescence (PL) measurements. PL indicated that the junctions have emissions from visible to NIR regions that make them promising as optically pumped white-light sources as well as waveguide applications, and the impact of the base substrate on enhancing the emission has been investigated via PL measurements. Electroluminescence measurements show that the prepared heterostructures on fluorine-doped tin oxide (FTO) substrate have sharp random lasing spikes over the range of PL samples spectra as the sample can lase randomly by light scattering through the Ge-doped nanocrystalline materials. The charge carrier lifetime measurements show high lifetime for the prepared sample. These give them the chance to be a candidate for white-light random laser diode applications.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call