Total reflection x-ray fluorescence analysis with synchrotron radiation and other sources for trace element determination

Abstract

Total reflection x-ray fluorescence analysis (TXRF) is an accepted powerful analytical tool for trace element determination in various kinds of samples. In typical applications like environmental, medical and technical sample analysis as well as for quality control during production processes, ultralow concentrations at the pg/g level, or femtogram masses, have to be determined. The combination of synchrotron radiation (SR) and multilayer monochromators together with TXRF is perfectly suited to meet the requirements. Best results can be expected from SR-TXRF though cost and accessability to SR sources limit the application. In some cases the additional inherent advantage of XRF as a nondestructive method is important. Another approach to reach such low detection limits is to increase the photon flux on the sample by means of high power x-ray tubes and multilayer focusing x-ray optics. With standard laboratory equipment the choice of appropriate anode materials for efficient excitation of specific elements and an optimal design of the energy dispersive spectrometer can also increase sensitivity. Various experimental setups used for EDXRF of the elements from B to U by K-shell excitation will be presented and discussed. The results from ultralow trace element analysis of surface impurities on Si wafers demonstrate the excellent potential of this method. With SR-TXRF the detection limits for medium Z elements can be below 20 femtogram.