Abstract
Total-electron-yield (TEY) X-ray standing-wave measurements of multilayer X-ray mirrors by monitoring sample photocurrent have been performed to obtain information on their layer/interface structure. This simple TEY X-ray standing-wave method enables simultaneous spectral measurement of the X-ray standing-wave and Bragg reflection. From simultaneous measurement of TEY X-ray standing-wave and Bragg reflection spectra of Mo/SiC/Si multilayers, shrinkage of the layer structure was observed along with disordering at the interface by annealing. Mapping measurements of the X-ray standing-wave signals in a Mo/Si multilayer can also be achieved on normal incidence, visibly illustrating the spatial distribution of interface structure in the sample plane.
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