Abstract
Electron impact total cross sections (50–2000 eV) and total ionization cross sections (threshold to 2000 eV) are calculated for typical plasma etching molecules CF4, C2F4, C2F6, C3F8 and CF3I and the CFx (x = 1–3) radicals. The total elastic and inelastic cross sections are determined in the spherical complex potential formalism. The sum of the two gives the total cross section and the total inelastic cross section is used to calculate the total ionization cross sections. The present total and ionization cross sections are found to be consistent with other theories and experimental measurements, where they exist. Our total cross section results for CFx (x = 1–3) radicals presented here are first estimates on these species.
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