Abstract

The manner in which magnetization reversal process of coupled NiFeCo films are affected by various surface topography conditions of integrated circuit (IC) underlayers was examined. The experimental results demonstrated that the topography of underlayers play a significant role in affecting the magnetization reversal characteristics of the coupled films. A hysteresis loop with lower coercivity and homogeneous switching field distribution can be obtained for the coupled films deposited on underlayer with a smooth surface topography. When the coupled films were deposited on underlayers having severe surface topography, a hysteresis loop with higher coercivity and inhomogeneous switching field distribution was obtained. Such behavior may be attributed to induced inhomogeneous coupling in the coupled films due to the severe topography.

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