Abstract
Vertical Si nano-rings with a uniform thickness of about 100 nm have been fabricated byconventional optical photolithography with a low cost based on Poisson diffraction.Moreover, the roughness of the Si nano-rings can be effectively reduced by sacrificialoxidation. In order to increase the density of the nano-rings, coaxial twin Si nano-ringshave been fabricated by the Poisson diffraction method combined with the spacertechnique. The thickness of both the inner and outer Si nano-rings is about 60 nm, and thegap between the twin nano-rings is about 100 nm.
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