Abstract
TiZrN thin films were prepared by DC magnetron sputtering on silicon (111) substrates. Samples were subjected to different temperature conditions (200, 400, and 600 °C) under a flow of carbon dioxide to emulate a corrosive atmosphere. Each treatment was performed in situ. X-ray photoelectron spectroscopy was used to examine the surface chemical changes on TiZrN thin films before and after the treatments. Survey spectra and C 1s, O 1s, N 1s, Ti 2p, and Zr 3d core level spectra were measured for each sample. Results show remarkable differences in all spectra when the sample was heated over 400 °C. At these temperatures, it is evident that the coating undergoes the greatest chemical change since metals cease to be nitrides and oxidize.
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