Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation

Abstract

We examined titanium oxide films and their barrier characteristics. Titanium oxide films were deposited at room temperature with electron cyclotron resonance plasma power of 300 W. We measured the growth rate of the titanium oxide film to be 1.8 Å/cycle. Barrier layers on poly(ether sulfon) (PES) substrates were observed to provide activation energy for water permeation. Activation energy of 12.4 kJ/mol was added by applying a titanium oxide coating with a thickness of 100 nm. The passivation performance of the titanium oxide film was also investigated using organic light-emitting diodes (OLEDs). The relative luminance of a 400-nm-thick-coated OLED device was diminished by 11.6% for 20 h.