Abstract
Abstract We have studied the features of the Ti macroparticles (MPs) accumulation on a substrate immersed in a DC vacuum arc plasma with a high frequency short pulse negative bias. The influence of several factors including processing time, the parameters of bias potential, and substrate characteristics was defined. It was found that the MP accumulation on a repetitively biased substrate was uneven over time. A deposition of MPs to substrate were significantly decreased after 1 min of processing at bias parameters f = 10 5 p.p.s., φ b = −2 kV and τ = 7 μs. It was experimentally shown that DC vacuum arc plasma without pre-filtering of MPs can be used for high frequency short pulse plasma immersion metal ion implantation.
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