Abstract
Abstract TiO 2 films were successfully grown on synthetic mica powders via Chemical Vapor Deposition (CVD). The CVD rig is a cold-walled design that allows surface coverage of a powder to be successfully achieved. The TiO 2 was produced by the reaction between TiCl 4 and Ethyl Acetate. The powder produced could be successfully N-doped using post liquid ammonia treatment. The TiO 2 powder produced could have potential applications in self-cleaning surfaces or antimicrobial paints.
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