TiO 2 thin film deposition from solution using microwave heating

Abstract

A new method has been devised for the deposition of TiO 2 thin films on conducting glass using a microwave reactor. The substrates are immersed in a diluted homogeneous aqueous solution which was prepared by mixing equal volumes of a fluorine-complexed titanium(IV) solution ([Ti]=3.4×10 −2 M) and 6.8×10 −2 M boric acid solution. Low microwave power and short deposition time have been used. The TiO 2 layers obtained are well-adhered, homogenous, with good specularity and colored by interference of reflected light. Their thickness is in the range of 100–500 nm. SEM experiments denote that films are formed by small crystallites having linear dimensions under 100 nm. Crystal dimensions depend on microwave power and deposition time. The layers show a high degree of crystallinity and the observed crystal phase is anatase. Microwave heating has proved to be an efficient and inexpensive method for solution growth of TiO 2 films; it should also be of importance for other materials layers grown from solution.