Abstract

Tin whisker growth was investigated in pure Sn using Blech structure. Blech structure was used to investigate the electromigration behavior in pure tin, in which 5000 Å tin strips were on 700 Å titanium films. Tin whiskers grew on the anode side, and voids were observed on the cathode side after stressing at the current densities of 7.5×104 and 1.5×105 A/cm2 at room temperature. To investigate temperature effect, samples are stressed at room temperature and 50 °C. The whisker growth rates were estimated to be 3 and 7.7 Å/s at room temperature and at 50 °C, respectively, in the current density of 1.5×105 A/cm2. The whisker growth rate reduced to 0.4 Å/s at the current density of 7.5×104 A/cm2, which is still faster than that driven by mechanical stress. Transmission electron microscopy results showed that the whiskers are single crystalline and a thin Sn oxide formed on their surfaces. The mechanism of tin whisker growth driven by electrical force is proposed in this article.

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