Abstract

As the ultimate miniaturization of semiconductor devices approaches, it is imperative that the effects of single dopants be clarified. Beyond providing insight into functions and limitations of conventional devices, such information enables identification of new device concepts. Investigating single dopants requires sub-nanometre spatial resolution, making scanning tunnelling microscopy an ideal tool. However, dopant dynamics involve processes occurring at nanosecond timescales, posing a significant challenge to experiment. Here we use time-resolved scanning tunnelling microscopy and spectroscopy to probe and study transport through a dangling bond on silicon before the system relaxes or adjusts to accommodate an applied electric field. Atomically resolved, electronic pump-probe scanning tunnelling microscopy permits unprecedented, quantitative measurement of time-resolved single dopant ionization dynamics. Tunnelling through the surface dangling bond makes measurement of a signal that would otherwise be too weak to detect feasible. Distinct ionization and neutralization rates of a single dopant are measured and the physical process controlling those are identified.

Highlights

  • As the ultimate miniaturization of semiconductor devices approaches, it is imperative that the effects of single dopants be clarified

  • Dopant dynamics must exist on much faster time scales as well, but have not yet been observed using Scanning tunnelling microscopy (STM)

  • Our model permits a robust description of the dynamics observed and demonstrates that the sharp tunnelling current features stem from the gating influence and ionization thresholds of nearby dopants

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Summary

Introduction

As the ultimate miniaturization of semiconductor devices approaches, it is imperative that the effects of single dopants be clarified. Resolved, electronic pump-probe scanning tunnelling microscopy permits unprecedented, quantitative measurement of time-resolved single dopant ionization dynamics. Scanning tunnelling microscopy (STM) has enabled significant progress in this field, including observation of the influence of single dopants on the local density of states[3,4,5,6] and local magnetic properties[7,8] of the host semiconductor. This allows detection of the dopant charge state in a method analogous to a single atom gated transistor: the bulk acts as the source, the DB (strongly coupled to the tip) is the drain, and the dopant is the gate. A combination of fast real-time acquisition and pump-probe techniques enables temporal mapping of the local dopant dynamics from nanoseconds to seconds by exploiting the DB’s amplification of the single dopant effects

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