Time-evolution of thermal oxidation on high-index silicon surfaces: Real-time photoemission spectroscopic study with synchrotron radiation

Abstract

The initial oxidation on high-index silicon surfaces with (113) and (120) orientations at 820K has been investigated by real-time X-ray photoemission spectroscopy (Si 2p and O 1s) using 687eV photons. The time evolutions of the Sin+ (n=1–4) components in the Si 2p spectrum indicate that the Si2+ state is suppressed on high-index surfaces compared with Si(001). The O 1s state consists of two components, a low-binding-energy component (LBC) and a high-binding-energy component (HBC). It is suggested that the O atom in strained SiOSi contributes to the LBC component. The reaction rates are slower on high-index surfaces compared with that on Si(001).