Time-dependent angular and energy distributions of sputtered copper atoms

Abstract

Time reference was introduced in the TRIM computer simulation code without changing the "event-driven" logic of the program. The code was applied to model the atomic collision cascades and sputtering of amorphous copper targets caused by bombardment of keV ions of different masses (Be, Ne, Ar, Cu, Xe, Au). Time-dependent characteristics of ion-induced processes such as mean number and energy of moving target atoms, number of collisions and vacancies (or) recoils created, sputtering yield, mean energy and angle of ejection of sputtered atoms were obtained, and their dependence on the ion/atom mass ratio is discussed. PACS No.: 79.20-m