Abstract
A graphite probe with Ti films (60 nm) was exposed to the scrape-off plasma of JIPP T-IIU to study surface effects by edge plasma. The surface and in-depth profile of the surface region were analyzed by RBS, PIXE, XPS and AES after 4 plasma discharges. Surface sputtering, deposition of impurities and surface modification were found to occur simultaneously during plasma discharges. About a half amount of pre-evaporated Ti was lost due to sputting, while the amount of deposited metallic impurities was maximum at the surface facing the ion drift side. The sputtering and deposition were not very significant, while the surface modification to form TiC was enhanced significantly at the surface facing the electron drift side.
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