Abstract
The nitriding process of Ti in N2 stream has been studied through weight-increase, hardness-increase and change of microstructure, and the surface films formed have been examined by electron diffraction. The weight-increase at 800∼1000°C has shown the nitriding to follow the parabolic law in accordance with many previous works, and the activation energy has been determined to be 45,500 cal/mol·deg.Diffraction tests have revealed surface films to consist of TiN above 800°C but of the oxide at 700°C. While the formation of the hardened surface layer is not remarkable at 800°C, the increased diffusion of N2 causes the hardened layer to be thickened progressively with increase in time above 900°C. The most suitable temperature for the surface hardening of Ti has been found from the present study to be 850∼900°C.
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