Abstract
In this work, a design of transparent conductive oxide less electrochemical luminescence (TCO-less ECL) cell has been proposed using a Ti metal layer as the secondary electrode. Ti metal films (∼500 nm in thickness) are deposited on a glass substrate without Fluorine-doped SnO2 (FTO) by RF magnetron sputtering. The TCO-less ECL cell is composed of a glass substrate/Ti metal/porous TiO2/Ru(II) complex/counter electrode. The Ti metal layer with high conductivity can collect electrons from the TiO2 layer and prevent electrons from back-transferring from the Ti to the electrolyte. The vacuum annealing treatment is important to ensure solid interconnections of porous TiO2 with underlying Ti metal layers. The ECL efficiency of the TCO-less cell consisting of the layer of Ti and porous TiO2 was ∼290 cd/m2, much higher than the efficiency (125 cd/m2) of general cell with FTO glass/Ru(II) complex in propylene carbonate/counter electrode configuration.
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