Abstract
The threshold voltage shift caused by quantum confinement in ultra-thin body devices (UTB) is observed experimentally. An analytical model is proposed and shows a good agreement with the experimental data of both PMOSFET and NMOSFET. It predicts a larger threshold voltage shift for a lighter body-doping, which is opposite to the trend in the bulk device. This threshold voltage shift must be taken into account in the design of UTB devices, including the double gate MOSFET.
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