Abstract

In this study, a 3D structured CMOS image sensor that can process signals pixelwise in parallel is investigated as a means to simultaneously increase the pixel count and frame rate. To enhance sensor performance beyond current technologies, higher integration via multilayer stacking is essential. We developed a multilayering technique based on repetitive Au electrode embedding, direct bonding, and Si substrate removal processes. To this end, we fabricated a three-layered daisy-chain test device with 6-μm-pitch Au electrodes. Experimental results show that the series of electrical interconnections exceeds 986,000 contacts with an Au contact resistance of ~92.8 mΩ for a single connection.

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