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Abstract
Thermal crosslinking reactivity and lithographic performance were investigated for three-component photoresists composed of a Brønsted acid-based binder polymer, a vinyl ether monomer as a crosslinking agent, and a photoacid generator. Poly(p-hydroxystyrene) (PHS) and poly(styrene-co-acrylic acid) (PST/PAA) were used as the binder polymers. The resists acted as highly sensitive, chemically amplified resists based on thermal crosslinking between a binder resin and a vinyl ether monomer and subsequent acidolytic cleavage of the crosslinks. The rate constants and activation energies for the thermal crosslinking reactions were determined, and the resists based on PST/PAA showed higher thermal crosslinking reactivity than PHS resists. The resists in this study exhibited high photosensitivity and afforded positive-tone images by alkaline development.
Published Version
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