Abstract

We present a new scheme for three-dimensional (3D) atom localization in a four-level atomic system based on the interference of double-dark resonances. Owing to the space-dependent atom-field interaction, the position probability distribution of the atom can be directly determined by measuring the probe absorption. It is found that, by properly varying the parameters of the system, the probability of finding the atom in 3D space can be 1/2. Our scheme opens a promising way to achieve high-precision and high-efficiency 3D atom localization, which provides some potential applications in the atom nanolithography via 3D atom localization.

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