Abstract

Particles and fields represent two major modeling paradigms in pure and applied science at all. In this paper a methodology and some of the results for three-dimensional (3D) simulations that include both field and particle abstractions are presented. Electromagnetic field calculations used here are based on the discrete differential form representation of the finite elements method, while the Monte Carlo method makes foundation of the particle part of the simulations. The first example is the simulation of the feature profile evolution during SiO2 etching enhanced by Ar + /CF4 non-equilibrium plasma based on the sparse field method for solving level set equations. Second example is devoted to the design of a spiral inflector which is one of the key devices of the axial injection system of the VINCY Cyclotron.

Highlights

  • As already pointed out, fields and particles are two the most important modeling paradigms in pure and applied science at all

  • Electromagnetic field calculations used here are based on the discrete differential form representation of the finite elements method, while the Monte Carlo method makes foundation of the particle part of the simulations

  • The first example is the simulation of the feature profile evolution during SiO2 etching enhanced by Ar + /CF4 non-equilibrium plasma based on the sparse field method for solving level set equations

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Summary

Introduction

Fields and particles are two the most important modeling paradigms in pure and applied science at all. The second one is to perform direct numerical simulation of systems that contain discrete point-like entities such as ions or molecules. In both scenarios, the application contains one or more sets of particles. In order to specify a field one must specify the locations at which the field’s values are defined, and describe what happens at the boundaries of that region in space. For this purpose we use meshes which are discrete representations of the physical domains.

Software Design Issues
Electromagnetic Field Calculations
Simulation of Etching Profile Evolution
Inflector Design
Conclusion
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