Three-dimensional luminescence microscopy for quantitative plasma characterization in bulk semiconductors

Abstract

Important challenges remain in the development of ultrafast laser writing inside semiconductor materials because the properties of narrow gap materials cause strong propagation distortions to intense infrared light. Here, we introduce a simple and robust imaging method for high-dynamic-range investigations of the laser–matter interactions in bulk semiconductors. Supported by measurements in gallium arsenide and silicon, we show how z-scan imaging of the band-to-band radiative recombination enables quantitative reconstruction of the three-dimensional distributions of free-carriers generated by nonlinear ionization with ultrashort pulses. The validity is confirmed by comparisons with ultrafast transmission microscopy (shadowgraphy) images. The superior sensitivity of the zero-background luminescence method allows the measurement of local carrier densities as low as ≈1016 cm−3 inside GaAs that is inaccessible by shadowgraphy. It provides the first direct evidence of the low density plasma generated far prior to the focus that causes the previously reported intensity clamping phenomenon. The potential of this non-coherent 3D imaging method to assess complex beam distortion features is also exemplified by real-time pre-compensation of aberration for an intense interacting beam.