Abstract
Numerical simulation of gas flow, heat transfer, and particle transport in a horizontal diffusion is presented. The wafers are cooled by inlet cold gas convectively but heated by furnace wall radiatively. Gas velocity between the wafers appears to be small compared with the bulk gas flow. A significant cooling of the first wafer in the batch is observed. Trajectories of aerosol particles in the furnace are predicted by solving the corresponding Lagrangian equation of motion that includes effects of temperature, drag, lift, gravity, and Brownian motion. Particle transport and deposition on the wafers are evaluated using three-dimensional particle trajectories.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.