Abstract
We present an improved adaptive mesh process based on Riemannian transformation to control the accuracy in high field gradient representation for diffraction problems. Such an adaptive meshing is applied in representing the electromagnetic intensity around a metallic submicronic spherical particle, which is known to present high gradients in limited zones of space including the interference pattern of the electromagnetic field. We show that, the precision of the field variation being controlled, this improved scheme permits drastically decreasing the computational time as well as the memory requirements by adapting the number and the position of nodes where the electromagnetic field must be computed and represented.
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