Abstract

In order to mitigate the formation of threading dislocations in an In0.1Ga0.9Sb heteroepitaxial buffer layer grown on a (001) GaSb substrate, an AlSb blocking layer was grown within the buffer layer. Transmission electron microscopy measurements revealed that the film with the AlSb blocking layer had a significantly lower threading dislocation density than a buffer layer of equivalent thickness in the absence of the blocking layer. Because the AlSb blocking layer is of greater mechanical stiffness than the In0.1Ga0.9Sb buffer layer, attractive image forces that act to draw dislocations to the film surface are countered by repulsive image forces traceable to the In0.1Ga0.9Sb/AlSb interface. These experimental results are consistent with calculations based on anisotropic elasticity theory for repulsive image forces acting on a dislocation beneath the blocking layer.

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