Abstract

Third-harmonic generation (THG) microscopy is demonstrated as a powerful technique to visualize undeveloped photopolymerized microstructures within a negative photoresist film. By comparing the THG microscopy images of developed and undeveloped single-photon polymerized structures in a SU-8 film, THG was found to provide sufficient contrast for distinguishing polymerized and unpolymerized regions. This also suggests that the technique can be used as a complementary technique to visualize the effect of photoresist development where microstructure shrinkage could occur. In addition, we applied the technique to visualize a three-photon polymerized microstructure that was fabricated in the same microscopy setup. This demonstrates the potential of the technique for in situ microscopy of photopolymerized microstructures in three dimensions.

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