Abstract
AbstractThe thiol‐functionalized zirconium oxocluster Zr12(µ3‐O)8(µ3‐OH)8(MP)24 · 4MPA was used as inorganic nanosized building block in the thiol‐ene photopolymerization of APE and TH in a 1:1 molar mixture. Transparent and crack‐free coatings were obtained, and TEM analysis showed that the inorganic particles are well dispersed within the polymeric network with no significant macroscopic agglomeration. An increase of Tg values, storage modulus in the rubbery region, and thermal stability were evidenced by increasing the zirconium oxocluster content in the photocurable formulations. XPS analysis and SIMS depth profile were carried out on UV cured films and showed the presence of a homogeneously distributed zirconium oxocluster.magnified image
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