Thin-film laser scribing processes using ns, ps, and fs pulses in CIGS solar cell fabrication

Abstract

CIGS Photo-voltaic module has been studied to achieve high conversion efficiency, low material cost, and low level of environmental contamination issue. But, this benefit is not fully achieved in mass production because process is complicated and its yield is low in volume production. Laser scribing technique has been adapted from early development stage, but is not widely used due to issues in quality and cost. Both laser and mechanical scribing processes have their own benefits, but laser process is preferred due to higher conversion efficiency. P1, P2, and P3 scribing processes have been widely studied focused on ns lasers. With ns laser processes, specification is not fully achieved due to quality issues including delamination, crack, and burr. The ps and fs lasers may overcome the issues and shows higher production cost than ns one. This paper introduces the P1, P2, and P3 processes using ns, ps, and fs lasers in CIGS process development. Laser parameters, process quality, and process mechanisms are compared for three different pulse-width regimes.CIGS Photo-voltaic module has been studied to achieve high conversion efficiency, low material cost, and low level of environmental contamination issue. But, this benefit is not fully achieved in mass production because process is complicated and its yield is low in volume production. Laser scribing technique has been adapted from early development stage, but is not widely used due to issues in quality and cost. Both laser and mechanical scribing processes have their own benefits, but laser process is preferred due to higher conversion efficiency. P1, P2, and P3 scribing processes have been widely studied focused on ns lasers. With ns laser processes, specification is not fully achieved due to quality issues including delamination, crack, and burr. The ps and fs lasers may overcome the issues and shows higher production cost than ns one. This paper introduces the P1, P2, and P3 processes using ns, ps, and fs lasers in CIGS process development. Laser parameters, process quality, and process mechanisms are ...